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Volumn 39, Issue 12, 2008, Pages 1444-1451
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Effect of annealing on the structural, optical and electrical properties of ITO films by RF sputtering under low vacuum level
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Author keywords
Annealing; Electrical properties; Indium tin oxide (ITO); Optical properties; Sputtering; X ray diffraction
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Indexed keywords
ANNEALING;
ARGON;
ELECTRIC PROPERTIES;
ELECTRIC RESISTANCE;
ELECTROMAGNETIC WAVES;
INDIUM;
INERT GASES;
MICROSCOPIC EXAMINATION;
OPTICAL MATERIALS;
OPTICAL PROPERTIES;
ORGANIC POLYMERS;
OXIDE FILMS;
OXYGEN;
PHOTOLITHOGRAPHY;
REFLECTION;
REFRACTIVE INDEX;
SPECTROPHOTOMETRY;
SURFACE ROUGHNESS;
THICK FILMS;
TIN;
TITANIUM COMPOUNDS;
X RAY ANALYSIS;
X RAY DIFFRACTION ANALYSIS;
ANNEALED FILMS;
ARGON ATMOSPHERES;
BASE PRESSURES;
BEST FITS;
DAMPING CONSTANTS;
DIELECTRIC FUNCTION MODELS;
DRUDE MODELS;
EFFECTIVE MEDIUM THEORIES;
ELECTRICAL MEASUREMENTS;
ELECTRICAL PROPERTIES;
HIGH TRANSPARENCIES;
INDIUM TIN OXIDE (ITO);
INDIUM TIN OXIDE THIN FILMS;
IR WAVELENGTHS;
ITO FILMS;
LOW VACUUMS;
OPTICAL AND ELECTRICAL PROPERTIES;
OPTICAL BEHAVIOURS;
OPTICAL TRANSMITTANCES;
REFLECTION SPECTRUMS;
REFRACTIVE INDEX PROFILES;
RESIDUAL PRESSURES;
RESULTING OPTICAL PROPERTIES;
RF-SPUTTERING;
SPUTTERING POWERS;
SUBSTRATE HEATING;
TEMPERATURE RANGES;
WAVELENGTH RANGES;
X-RAY DIFFRACTION;
OPTICAL FILMS;
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EID: 56049114865
PISSN: 00262692
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mejo.2008.06.081 Document Type: Article |
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Times cited : (74)
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References (40)
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