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Volumn 106, Issue 5, 2009, Pages

Development of atomic radical monitoring probe and its application to spatial distribution measurements of H and O atomic radical densities in radical-based plasma processing

(7) Takahashi, Shunji a,b Takashima, Seigo c Yamakawa, Koji b Den, Shoji b Kano, Hiroyuki d Takeda, Keigo a Hori, Masaru a,e

a NAGOYA UNIVERSITY (Japan)

b Katagiri Engineering Co Ltd (Japan)

c Nagoya Urban Industries Promotion Corporation (Japan)

d NU EcoEngineering Co Ltd (Japan)

e JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSOLUTE DENSITY; CARBON ATOMS; HOLLOW CATHODE LAMP; IN-PROCESS; MICRO-PLASMAS; MICRODISCHARGES; PLASMA PROCESSING; PROBE SIZE; PROCESS PLASMA; RADIAL DIRECTION; RADICAL DENSITIES; SPATIAL DISTRIBUTION; VACUUM ULTRAVIOLET ABSORPTION SPECTROSCOPIES;

ABSORPTION SPECTROSCOPY; ATMOSPHERIC PRESSURE; HYDROGEN; LIGHT; LIGHT SOURCES; MONITORING; ONTOLOGY; OXYGEN; PLASMA DEVICES; PLASMAS; PROBES; SIZE DISTRIBUTION;

ATOMIC SPECTROSCOPY;

EID: 70349349134 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3212990 Document Type: Article

Times cited : (27)

References (25)

1
- 3042635867
- 0003-6951. 10.1063/1.1762702
- M. Hiramatsu, K. Shiji, H. Amano, and M. Hori, Appl. Phys. Lett. 0003-6951 84, 4708 (2004). 10.1063/1.1762702
- (2004) Appl. Phys. Lett. , vol.84 , pp. 4708
- Hiramatsu, M.¹ Shiji, K.² Amano, H.³ Hori, M.⁴

2
- 42149146117
- Plasma damage mechanisms for low- k porous SiOCH films due to radiation, radicals, and ions in the plasma etching process
- DOI 10.1063/1.2891787
- S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, and T. Tatsumi, J. Appl. Phys. 0021-8979 103, 073303 (2008). 10.1063/1.2891787 (Pubitemid 351537964)
- (2008) Journal of Applied Physics , vol.103 , Issue.7 , pp. 073303
- Uchida, S.¹ Takashima, S.² Hori, M.³ Fukasawa, M.⁴ Ohshima, K.⁵ Nagahata, K.⁶ Tatsumi, T.⁷

3
- 55049134807
- 0021-4922. 10.1143/JJAP.47.3621
- S. Uchida, S. Takashima, M. Hori, M. Fukasawa, K. Ohshima, K. Nagahata, and T. Tatsumi, Jpn. J. Appl. Phys. 0021-4922 47, 3621 (2008). 10.1143/JJAP.47.3621
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 3621
- Uchida, S.¹ Takashima, S.² Hori, M.³ Fukasawa, M.⁴ Ohshima, K.⁵ Nagahata, K.⁶ Tatsumi, T.⁷

4
- 33646368372
- Progress of radical measurements in plasmas for semiconductor processing
- DOI 10.1088/0963-0252/15/2/S10, PII S0963025206105678
- M. Hori and T. Goto, Plasma Sources Sci. Technol. 0963-0252 15, S74 (2006). 10.1088/0963-0252/15/2/S10 (Pubitemid 43672646)
- (2006) Plasma Sources Science and Technology , vol.15 , Issue.2
- Hori, M.¹ Goto, T.²

5
- 34248366587
- Insights into sticking of radicals on surfaces for smart plasma nano-processing
- DOI 10.1016/j.apsusc.2007.02.006, PII S0169433207001948, The 4th International Workshop on Basic Aspects of Nonequilibrium Plasmas Interacting with Surfaces; Negative Ions, their function and Designability, and the 4th EU-Japan Joint Symposium on plasma Pro
- M. Hori and T. Goto, Appl. Surf. Sci. 0169-4332 253, 6657 (2007). 10.1016/j.apsusc.2007.02.006 (Pubitemid 46734485)
- (2007) Applied Surface Science , vol.253 , Issue.16 , pp. 6657-6671
- Hori, M.¹ Goto, T.²

6
- 0001338738
- 0021-8979. 10.1063/1.366110
- J. Amorim, J. Loureiro, G. Baravian, and M. Touzeau, J. Appl. Phys. 0021-8979 82, 2795 (1997). 10.1063/1.366110
- (1997) J. Appl. Phys. , vol.82 , pp. 2795
- Amorim, J.¹ Loureiro, J.² Baravian, G.³ Touzeau, M.⁴

7
- 0000534308
- 0021-8979. 10.1063/1.347395
- J. P. Booth, O. Joubert, J. Pelletier, and N. Sadeghi, J. Appl. Phys. 0021-8979 69, 618 (1991). 10.1063/1.347395
- (1991) J. Appl. Phys. , vol.69 , pp. 618
- Booth, J.P.¹ Joubert, O.² Pelletier, J.³ Sadeghi, N.⁴

8
- 0000275533
- 0003-6951. 10.1063/1.118582
- K. Sasaki, Y. Kawai, and K. Kadota, Appl. Phys. Lett. 0003-6951 70, 1375 (1997). 10.1063/1.118582
- (1997) Appl. Phys. Lett. , vol.70 , pp. 1375
- Sasaki, K.¹ Kawai, Y.² Kadota, K.³

9
- 0000426002
- 0003-6951. 10.1063/1.123861
- K. Tachibana and H. Kamisugi, Appl. Phys. Lett. 0003-6951 74, 2390 (1999). 10.1063/1.123861
- (1999) Appl. Phys. Lett. , vol.74 , pp. 2390
- Tachibana, K.¹ Kamisugi, H.²

10
- 0001376970
- 0003-6951. 10.1063/1.125497
- S. Takashima, M. Hori, T. Goto, A. Kono, M. Ito, and K. Yoneda, Appl. Phys. Lett. 0003-6951 75, 3929 (1999). 10.1063/1.125497
- (1999) Appl. Phys. Lett. , vol.75 , pp. 3929
- Takashima, S.¹ Hori, M.² Goto, T.³ Kono, A.⁴ Ito, M.⁵ Yoneda, K.⁶

11
- 0035271895
- Development of vacuum ultraviolet absorption spectroscopy technique employing nitrogen molecule microdischarge hollow cathode lamp for absolute density measurements of nitrogen atoms in process plasmas
- DOI 10.1116/1.1340655
- S. Takashima, S. Arai, M. Hori, T. Goto, A. Kono, M. Ito, and K. Yoneda, J. Vac. Sci. Technol. A 0734-2101 19, 599 (2001). 10.1116/1.1340655 (Pubitemid 32394431)
- (2001) Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films , vol.19 , Issue.2 , pp. 599-602
- Takashima, S.¹ Arai, S.² Hori, M.³ Goto, T.⁴ Kono, A.⁵ Ito, M.⁶ Yoneda, K.⁷

12
- 0042266887
- 0034-6748. 10.1063/1.1582386
- H. Nagai, M. Hiramatsu, M. Hori, and T. Goto, Rev. Sci. Instrum. 0034-6748 74, 3453 (2003). 10.1063/1.1582386
- (2003) Rev. Sci. Instrum. , vol.74 , pp. 3453
- Nagai, H.¹ Hiramatsu, M.² Hori, M.³ Goto, T.⁴

13
- 67649519950
- 0021-8979. 10.1063/1.3091279
- W. Takeuchi, H. Sasaki, S. Kato, S. Takashima, M. Hiramatsu, and M. Hori, J. Appl. Phys. 0021-8979 105, 113305 (2009). 10.1063/1.3091279
- (2009) J. Appl. Phys. , vol.105 , pp. 113305
- Takeuchi, W.¹ Sasaki, H.² Kato, S.³ Takashima, S.⁴ Hiramatsu, M.⁵ Hori, M.⁶

14
- 70349368230
- unpublished
- K. Takeda, S. Takashima, and M. Hori, Proceedings of the 25th Symposium on Plasma Processing, 2008 (unpublished), p. 311.
- (2008) Proceedings of the 25th Symposium on Plasma Processing , pp. 311
- Takeda, K.¹ Takashima, S.² Hori, M.³

15
- 0001337978
- 0021-8979. 10.1063/1.1305559
- S. Tada, S. Takashima, M. Ito, M. Hori, T. Goto, and Y. Sakamoto, J. Appl. Phys. 0021-8979 88, 1756 (2000). 10.1063/1.1305559
- (2000) J. Appl. Phys. , vol.88 , pp. 1756
- Tada, S.¹ Takashima, S.² Ito, M.³ Hori, M.⁴ Goto, T.⁵ Sakamoto, Y.⁶

16
- 0035340325
- 0021-8979. 10.1063/1.1362414
- S. Takashima, M. Hori, T. Goto, and K. Yoneda, J. Appl. Phys. 0021-8979 89, 4727 (2001). 10.1063/1.1362414
- (2001) J. Appl. Phys. , vol.89 , pp. 4727
- Takashima, S.¹ Hori, M.² Goto, T.³ Yoneda, K.⁴

17
- 0035576034
- Absolute concentration and loss kinetics of hydrogen atom in methane and hydrogen plasmas
- DOI 10.1063/1.1410327
- S. Takashima, M. Hori, T. Goto, A. Kono, and K. Yoneda, J. Appl. Phys. 0021-8979 90, 5497 (2001). 10.1063/1.1410327 (Pubitemid 33599675)
- (2001) Journal of Applied Physics , vol.90 , Issue.11 , pp. 5497-5503
- Takashima, S.¹ Hori, M.² Goto, T.³ Kono, A.⁴ Yoneda, K.⁵

18
- 0035862498
- 0021-4922. 10.1143/JJAP.40.L4
- K. Murata, Y. Mizutani, E. Iwasaka, S. Takashima, M. Hori, T. Goto, S. Samukawa, and T. Tsukada, Jpn. J. Appl. Phys., Part 2 0021-4922 40, L4 (2001). 10.1143/JJAP.40.L4
- (2001) Jpn. J. Appl. Phys., Part 2 , vol.40
- Murata, K.¹ Mizutani, Y.² Iwasaka, E.³ Takashima, S.⁴ Hori, M.⁵ Goto, T.⁶ Samukawa, S.⁷ Tsukada, T.⁸

19
- 0036656360
- 0021-4922. 10.1143/JJAP.41.4691
- S. Tada, S. Takashima, M. Ito, M. Hamagaki, M. Hori, and T. Goto, Jpn. J. Appl. Phys., Part 1 0021-4922 41, 4691 (2002). 10.1143/JJAP.41.4691
- (2002) Jpn. J. Appl. Phys., Part 1 , vol.41 , pp. 4691
- Tada, S.¹ Takashima, S.² Ito, M.³ Hamagaki, M.⁴ Hori, M.⁵ Goto, T.⁶

20
- 33845468902
- 3 plasmas
- DOI 10.1063/1.1435825
- H. Nagai, S. Takashima, M. Hiramatsu, M. Ito, M. Hori, and T. Goto, J. Appl. Phys. 0021-8979 91, 2615 (2002). 10.1063/1.1435825 (Pubitemid 34598711)
- (2002) Journal of Applied Physics , vol.91 , Issue.5 , pp. 2615
- Nagai, H.¹ Takashima, S.² Hiramatsu, M.³ Hori, M.⁴ Goto, T.⁵

21
- 0038022802
- 0021-4922. 10.1143/JJAP.42.L326
- H. Nagai, Y. Maeda, M. Hiramatsu, M. Hori, and T. Goto, Jpn. J. Appl. Phys., Part 2 0021-4922 42, L326 (2003). 10.1143/JJAP.42.L326
- (2003) Jpn. J. Appl. Phys., Part 2 , vol.42 , pp. 326
- Nagai, H.¹ Maeda, Y.² Hiramatsu, M.³ Hori, M.⁴ Goto, T.⁵

22
- 0042011487
- 0021-8979. 10.1063/1.1588351
- H. Nagai, M. Hiramatsu, M. Hori, and T. Goto, J. Appl. Phys. 0021-8979 94, 1362 (2003). 10.1063/1.1588351
- (2003) J. Appl. Phys. , vol.94 , pp. 1362
- Nagai, H.¹ Hiramatsu, M.² Hori, M.³ Goto, T.⁴

23
- 18444391263
- 10.1016/j.diamond.2004.10.021 0925-9635
- K. Shiji, M. Hiramatsu, A. Enomoto, M. Nakamura, H. Amano, and M. Hori, Diamond Relat Mater. 14, 831 (2005). 10.1016/j.diamond.2004.10.021 0925-9635
- (2005) Diamond Relat Mater. , vol.14 , pp. 831
- Shiji, K.¹ Hiramatsu, M.² Enomoto, A.³ Nakamura, M.⁴ Amano, H.⁵ Hori, M.⁶

24
- 38849084568
- 2 plasma glass cleaning process
- DOI 10.1063/1.2830982
- M. Iwasaki, Y. Matsudaira, K. Takeda, M. Ito, E. Miyamoto, T. Yara, T. Uehara, and M. Hori, J. Appl. Phys. 0021-8979 103, 023303 (2008). 10.1063/1.2830982 (Pubitemid 351190675)
- (2008) Journal of Applied Physics , vol.103 , Issue.2 , pp. 023303
- Iwasaki, M.¹ Matsudaira, Y.² Takeda, K.³ Ito, M.⁴ Miyamoto, E.⁵ Yara, T.⁶ Uehara, T.⁷ Hori, M.⁸

25
- 40049111835
- Nonequilibrium atmospheric pressure plasma with ultrahigh electron density and high performance for glass surface cleaning
- DOI 10.1063/1.2885084
- M. Iwasaki, H. Inui, Y. Matsudaira, H. Kano, N. Yoshida, M. Ito, and M. Hori, Appl. Phys. Lett. 0003-6951 92, 081503 (2008). 10.1063/1.2885084 (Pubitemid 351323039)
- (2008) Applied Physics Letters , vol.92 , Issue.8 , pp. 081503
- Iwasaki, M.¹ Inui, H.² Matsudaira, Y.³ Kano, H.⁴ Yoshida, N.⁵ Ito, M.⁶ Hori, M.⁷

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