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Japanese Journal of Applied Physics

Volumn 48, Issue 6 PART 2, 2009, Pages

Lithographic performance of extreme ultravolet full-field exposure tool at selete

(7) Tawarayama, Kazuo a Aoyama, Hajime a Kamo, Takashi a Magoshi, Shunko a Tanaka, Yuusuke a Shirai, Seiichiro a Tanaka, Hiroyuki a

a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSION UNIFORMITIES; DYNAMIC EXPOSURE; EXPOSURE TOOL; FULL-FIELD; LINE-AND-SPACE; LITHOGRAPHY TOOLS; NUMERICAL APERTURE;

EXPOSURE METERS;

EID: 70249145082 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.06FA02 Document Type: Article

Times cited : (13)

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