Extreme ultraviolet lithography development in the United States

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5349-5353

  Wood, Obert ^a  

^a SEMATECH   (United States)

Author keywords

Extreme ultraviolet lithography; Mask blanks; Resist printing; Source collectors

Indexed keywords

MASKS; MULTILAYERS; PROTECTIVE COATINGS; RESEARCH LABORATORIES; SEMICONDUCTOR DEVICES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); MASK BLANKS; RESIST PRINTING; SOURCE COLLECTORS;

PHOTOLITHOGRAPHY;

EID: 33745664014     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.5349     Document Type: Review

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