Characteristics of ion-beam-sputtered highrefractive-index TiO2-SiO2 mixed films

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 16, Issue 6, 1999, Pages 1477-1483

  Chao, Shiuh ^a   Wang, Wen Hsiang ^a   Hsu, Min Yu ^b   Wang, Liang Chu ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; HIGH TEMPERATURE EFFECTS; ION BEAMS; LIGHT ABSORPTION; LIGHT SCATTERING; PHASE TRANSITIONS; REFRACTIVE INDEX; SILICA; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TITANIUM DIOXIDE;

ION-BEAM SPUTTERING;

OPTICAL FILMS;

EID: 0032606329     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.16.001477     Document Type: Article

References (9)

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