On the Use of Global Kinetics Models for the Investigation of Energy Deposition and Chemistry in RF Argon-Oxygen Plasmas Working in the Torr Regime

Plasma Chemistry and Plasma Processing

Volumn 23, Issue 1, 2003, Pages 117-140

  Morscheidt, W ^a,b   Hassouni, K ^a   Bauduin, N ^b   Arefi Khonsari, F ^b   Amouroux, J ^b  

^a UNIVERSITÉ PARIS 13   (France)

^b SORBONNE UNIVERSITÉ   (France)

Author keywords

Argon oxygen plasmas; Global plasma model; Low pressure; RF discharge

Indexed keywords

ARGON; DEPOSITION; ELECTRIC DISCHARGES; ENERGY DISSIPATION; IONIZATION; MOLECULAR VIBRATIONS; OXYGEN; PRESSURE EFFECTS; REACTION KINETICS; SENSITIVITY ANALYSIS; TIN COMPOUNDS;

ARGON-OXYGEN PLASMAS; ELECTRONEGATIVITY;

PLASMAS;

EID: 0037282043     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1022472904111     Document Type: Article

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