Truly quantitative XPS characterization of organic monolayers on silicon: Study of alkyl and alkoxy monolayers on H-Si(111)

Journal of the American Chemical Society

Volumn 127, Issue 21, 2005, Pages 7871-7878

  Wallart, Xavier ^a   De Villeneuve, Catherine Henry ^b   Allongue, Philippe ^b  

^a INSTITUT D ELECTRONIQUE   (France)

^b LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; INTERFACES (MATERIALS); SILICON COMPOUNDS; SURFACE CHEMISTRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

AZIMUTHAL VARIATIONS; ORGANIC MONOLAYERS; SURFACE COVERAGE; X-RAY PHOTODIFFRACTION (XPD);

MONOLAYERS;

ALKANE DERIVATIVE; ALKYL GROUP; DECANOL; GOLD; ORGANOSILICON DERIVATIVE; THIOL DERIVATIVE;

ARTICLE; CALCULATION; CHEMICAL ANALYSIS; CHEMICAL BOND; CHEMICAL COMPOSITION; QUANTITATIVE ANALYSIS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 19744366928     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja0430797     Document Type: Article

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