Self-aligned self-assembly process for fabricating organic thin-film transistors

Applied Physics Letters

Volumn 85, Issue 10, 2004, Pages 1849-1851

  Ando, Masahiko ^c   Kawasaki, Masahiro ^c   Imazeki, Shuji ^c   Sasaki, Hiroshi ^a   Kamata, Toshihide ^b  

^a HITACHI LTD   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRODES; MONOLAYERS; MORPHOLOGY; PHOTOLITHOGRAPHY; SELF ASSEMBLY; SEMICONDUCTOR MATERIALS;

DEVICE STRUCTURES; ELECTRONIC DEVICES; ORGANIC THIN FILMS; SELF ASSEMBLY MONOLAYERS(SAM);

THIN FILM TRANSISTORS;

EID: 4944242800     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1784871     Document Type: Article

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