Kinetics of electrochemical derivatization of the silicon surface by grignards

Langmuir

Volumn 18, Issue 15, 2002, Pages 5851-5860

  Fellah, Samira ^a   Teyssot, Anna ^a   Ozanam, François ^a   Chazalviel, Jean Noël ^a   Vigneron, Jacky ^b   Etcheberry, Arnaud ^b  

^a LABORATOIRE DE PHYSIQUE DE LA MATIÈRE CONDENSÉE   (France)

^b UNIVERSITÉ DE VERSAILLES SAINT QUENTIN EN YVELINES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROCHEMISTRY; HALOGENATION; HYDROGENATION; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); RATE CONSTANTS; X RAY PHOTOELECTRON SPECTROSCOPY;

GRIGNARD REAGENTS;

SILICON;

EID: 0037162614     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0203739     Document Type: Article

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