Controlled modification of octadecyltrichlorosilane self-assembled monolayer by CO2 plasma

Thin Solid Films

Volumn 496, Issue 2, 2006, Pages 612-618

  Delorme, Nicolas ^a   Bardeau, Jean François ^a   Bulou, Alain ^a   Poncin Epaillard, Fabienne ^a  

^a UNIVERSITÉ DU MAINE   (France)

Author keywords

Atomic force microscopy; Octadecyltrichlorosilane; Plasma processing; X ray photoelectron spectroscopy

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON DIOXIDE; CHEMICAL MODIFICATION; PLASMAS; SILANES; X RAY PHOTOELECTRON SPECTROSCOPY;

ALKOXYSILANE; CARBON DIOXIDE PLASMAS; OCTADECYLTRICHLOROSILANE; PLASMA PROCESSING;

SELF ASSEMBLY;

EID: 28044471821     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.09.105     Document Type: Article

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