Thickness measurement of SiO2 films thinner than 1 nm by X-ray photoelectron spectroscopy

Thin Solid Films

Volumn 500, Issue 1-2, 2006, Pages 356-359

  Joong Kim, Kyung ^a   Park, Ki Tae ^b   Lee, Jong Wan ^b  

^a Korea Research Institute of Standards and Science   (South Korea)

^b Hallym University   (South Korea)

Author keywords

Film thickness; Silicon oxide; Sputter deposition; Surface analysis; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; CRYSTAL STRUCTURE; FILM GROWTH; SILICA; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM THICKNESS; SILICON OXIDE; SURFACE ANALYSIS;

ULTRATHIN FILMS;

EID: 31644443317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.11.042     Document Type: Article

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