Wet etching and chemical polishing of InAs/GaSb superlattice photodiodes

Semiconductor Science and Technology

Volumn 24, Issue 6, 2009, Pages

  Chaghi, R ^a   Cervera, C ^a   Ait Kaci H ^a   Grech, P ^a   Rodriguez, J B ^a   Christol, P ^a  

^a UNIVERSITÉ MONTPELLIER II   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT AIR; CURRENT DEGRADATION; CURRENT-VOLTAGE MEASUREMENTS; ETCHING SOLUTIONS; INAS/GASB SUPERLATTICES; MID-INFRARED REGIONS; ORTHOPHOSPHORIC ACIDS; SODIUM HYPOCHLORITES; WET CHEMICALS; WET-CHEMICAL ETCHING; ZERO-BIAS RESISTANCE AREA PRODUCT;

CITRIC ACID; DEGRADATION; INDIUM ANTIMONIDES; PHOSPHORIC ACID; PHOTODIODES; PHOTORESISTS; POLISHING; SODIUM; SUPERLATTICES; WET ETCHING;

CHEMICAL POLISHING;

EID: 68249144154     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/24/6/065010     Document Type: Article

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