Halogen etching of group 13-15 (3-5) semiconductors and its relevance to chemical-mechanical polishing. The reactions of dibromine, dichlorine and sodium hypochlorite with gallium arsenide and related materials

Journal of Materials Chemistry

Volumn 7, Issue 12, 1997, Pages 2421-2426

  McGhee, Laurence ^a,c   Nicol, Irene ^a   Peacock, Robert D ^a   Robertson, Max I ^b   Stevenson, Paul R ^a   Winfield, John M ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b Logitech Ltd   (United Kingdom)

^c EKC Technology Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 27844572604     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/a706242g     Document Type: Article

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