Surface leakage reduction in narrow band gap type-II antimonide-based superlattice photodiodes

Applied Physics Letters

Volumn 94, Issue 5, 2009, Pages

  Huang, Edward Kwei Wei ^a   Hoffman, Darin ^a   Nguyen, Binh Minh ^a   Delaunay, Pierre Yves ^a   Razeghi, Manijeh ^a  

^a Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; ETCHING; INDUCTIVELY COUPLED PLASMA; PASSIVATION; PLASMA ETCHING; POLYIMIDES; POLYMERS;

ANTIMONIDE; COUPLED PLASMAS; CUT-OFF WAVELENGTHS; DARK CURRENT DENSITIES; DIFFERENTIAL RESISTANCES; DIFFUSION LIMITEDS; ELECTRON CYCLOTRONS; ETCHING TECHNIQUES; ICP ETCHINGS; NARROW BAND GAPS; ORDER OF MAGNITUDES; SUPERLATTICE PHOTODIODES; SURFACE LEAKAGES; SURFACE QUALITIES; SURFACE RESISTIVITIES; WET-ETCH; ZERO BIAS;

DRY ETCHING;

EID: 59849100931     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3078282     Document Type: Article

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