MEMS-based clamp with a passive hold function for precision position retaining of micro manipulators

Journal of Micromechanics and Microengineering

Volumn 19, Issue 6, 2009, Pages

  Brouwer, D M ^a,b   De Jong, B R ^c   De Boer, M J ^d   Jansen, H V ^d   Van Dijk, J ^a   Krijnen, G J M ^d   Soemers, H M J R ^a,c  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b DEMCON Advanced Mechatronics   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

^d UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

BACK-SIDE ETCHING; BLOCKING FORCES; CLAMPING FORCE; COMB-DRIVE ACTUATOR; CONFORMAL DEPOSITION; DEEP REACTIVE ION ETCHING; DYNAMIC BEHAVIORS; ELECTROSTATICALLY DRIVEN; EXACT CONSTRAINT; HIGH ASPECT RATIO; HOLD FUNCTION; LOCKING DEVICES; LOW-PRESSURE CHEMICAL VAPOR DEPOSITION; PARALLEL PLATES; PRECISION POSITION; SILICON BULK MICROMACHINING TECHNOLOGY; SIX-DEGREE-OF-FREEDOM; SUSPENSION STIFFNESS; TRENCH ISOLATION;

ACTUATORS; ASPECT RATIO; CLAMPING DEVICES; ELECTROSTATIC ACTUATORS; HEATING; MANIPULATORS; MEMS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MODAL ANALYSIS; POTASSIUM HYDROXIDE; SILICON NITRIDE;

REACTIVE ION ETCHING;

EID: 68249143371     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/19/6/065027     Document Type: Article

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