Low-temperature deposition of crystalline silicon nitride nanoparticles by hot-wire chemical vapor deposition

Journal of Crystal Growth

Volumn 311, Issue 15, 2009, Pages 3938-3942

  Kim, Chan Soo ^a   Youn, Woong Kyu ^a   Lee, Dong Kwon ^a   Seol, Kwang Soo ^b   Hwang, Nong Moon ^a  

^a Seoul National University   (South Korea)

^b Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

A1. Crystallites; A1. Nanostructures; A3. Chemical vapor deposition; A3. Polycrystalline deposition; B1. Silicon nitrides

Indexed keywords

A1. CRYSTALLITES; A1. NANOSTRUCTURES; A3. CHEMICAL VAPOR DEPOSITION; A3. POLYCRYSTALLINE DEPOSITION; B1. SILICON NITRIDES;

CRYSTALLITES; DEPOSITION; NANOCRYSTALLINE SILICON; NANOPARTICLES; SILICON NITRIDE; SUBSTRATES; VAPORS; WIRE;

CHEMICAL VAPOR DEPOSITION;

EID: 67650360946     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.05.035     Document Type: Article

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