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Volumn 515, Issue 19 SPEC. ISS., 2007, Pages 7446-7450
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Non-uniform deposition in the early stage of hot-wire chemical vapor deposition of silicon: The charge effect approach
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Author keywords
Charged nanoparticles; Chemical vapor deposition; Hot wire; Negative charge; Silicon
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
GAS MIXTURES;
GLASS;
NANOPARTICLES;
STAINLESS STEEL;
CHARGE REMOVAL;
GLASS SUBSTRATES;
HOT-WIRE CHEMICAL VAPOR DEPOSITION;
SILICON;
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EID: 34547598105
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2006.11.170 Document Type: Article |
Times cited : (16)
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References (16)
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