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Volumn 57, Issue 8, 2007, Pages 739-742

Crystallization of silicon nitride thin films synthesized by plasma-enhanced chemical vapour deposition

Author keywords

Chemical vapour deposition; Energy filtering transmission electron microscopy; Scanning electron microscopy; Silicone nitride; Thin films

Indexed keywords

CRYSTALLIZATION KINETICS; HIGH TEMPERATURE OPERATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 34548676209     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.06.035     Document Type: Article
Times cited : (16)

References (20)
  • 1
    • 34548681552 scopus 로고    scopus 로고
    • J. Antoszewski, M. Martyniuk, C.A. Musca, J.M. Dell, L. Faraone, in: Conference on Smart Materials, Nano- and Micro-Smart Systems, RMIT, Melbourne, Australia, SPIE Proc 4935, 2002, p. 148.
  • 10
    • 34548695551 scopus 로고    scopus 로고
    • N. Jehanathan, Y. Liu, J. Dell, Thin Solid Films, submitted for publication.
  • 13
    • 34548692423 scopus 로고    scopus 로고
    • S.P. Speakman, P.M. Read, A. Kiermasz, in: IPAT 87, 6th International Conference on Ion and Plasma Assisted Techniques, vol. 87, 1987, p. 273.
  • 20
    • 34548693996 scopus 로고    scopus 로고
    • ASM Engineering Materials Reference Book, ASM International, Materials Park, OH, 1994.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.