Deposition chemistry in the Cat-CVD processes of the SiH4/NH3 system

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 24-27

  Umemoto, Hironobu ^a   Morimoto, Takashi ^a   Yamawaki, Moroyuki ^a   Masuda, Yoshie ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic CVD; Laser spectroscopy; Mass spectrometry; Si3N4 films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DENSITY (SPECIFIC GRAVITY); LASERS; MASS SPECTROMETRY; SPECTROSCOPIC ANALYSIS; THIN FILMS;

LASER SPECTROSCOPY;

SILICON NITRIDE;

EID: 0038188553     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00124-X     Document Type: Conference Paper

References (35)

1. Matsumura H. Jpn. J. Appl. Phys., Part 1. 37:1998;3175.
2. Matsumura H. Thin Solid Films. 395:2001;1.
3. Matsumura H. J. Appl. Phys. 66:1989;3612.
4. Dupuie J.L., Gulari E., Terry F. J. Electrochem. Soc. 139:1992;1151.
5. Okada S., Matsumura H. Jpn. J. Appl. Phys., Part 1. 36:1997;7035.
6. Sato H., Izumi A., Matsumura H. Appl. Phys. Lett. 77:2000;2752.
7. Umeda T., Mochizuki Y., Miyoshi Y., Nashimoto Y. Thin Solid Films. 395:2001;266.
8. Patil S.B., Kumbhar A., Waghmare P., Rao V.R., Dusane R.O. Thin Solid Films. 395:2001;270.
9. Uchiyama Y., Masuda A., Matsumura H. Thin Solid Films. 395:2001;275.
10. Sato H., Izumi A., Masuda A., Matsumura H. Thin Solid Films. 395:2001;280.
11. Minamikawa T., Yonezawa Y., Heya A., Fujimori Y., Nakamura T., Masuda A., Matsumura H. Thin Solid Films. 395:2001;284.
12. R. Hattori, G. Nakamura, S. Nomura, T. Ichise, A. Masuda, H. Matsumura, Technical Digest of 19th IEEE GaAs Integrated Circuit Symposium, Anaheim, 1997, p. 78.
13. Nozaki Y., Kongo K., Miyazaki T., Kitazoe M., Horii K., Umemoto H., Masuda A., Matsumura H. J. Appl. Phys. 88:2000;5437.
14. Nozaki Y., Kitazoe M., Horii K., Umemoto H., Masuda A., Matsumura H. Thin Solid Films. 395:2001;47.
15. Umemoto H., Nozaki Y., Kitazoe M., Horii K., Ohara K., Morita D., Uchida K., Ishibashi Y., Komoda M., Kamesaki K., Izumi A., Masuda A., Matsumura H. J. Non-Cryst. Solids. 299-302:2002;9.
16. Umemoto H., Ohara K., Morita D., Nozaki Y., Masuda A., Matsumura H. J. Appl. Phys. 91:2002;1650.
17. Tange S., Inoue K., Tonokura K., Koshi M. Thin Solid Films. 395:2001;42.
18. Duan H.L., Zaharias G.A., Bent S.F. Thin Solid Films. 395:2001;36.
19. Duan H.L., Zaharias G.A., Bent S.F. Appl. Phys. Lett. 78:2001;1784.
20. Tonokura K., Inoue K., Koshi M. J. Non-Cryst. Solids. 299-302:2002;25.
21. H. Umemoto, K. Ohara, D. Morita, T. Morimoto, M. Yamawaki, A. Masuda, H. Matsumura, submitted for publication.
22. Boogaarts M.G.H., Böcker P.J., Kessels W.M.M., Schram D.C., van de Sanden M.C.M. Chem. Phys. Lett. 326:2000;400.
23. Kessels W.M.M., Leroux A., Boogaarts M.G.H., Hoefnagels J.P.M., van de Sanden M.C.M., Schram D.C. J. Vac. Sci. Technol. A. 19:2001;467.
24. Baklanov A.V., Krasnoperov L.N. J. Phys. Chem. A. 105:2001;4917.
25. Smith D.L., Alimonda A.S., Chen C.-C., Ready S.E., Wacker B. J. Electrochem. Soc. 137:1990;614.
26. Beach D.B., Jasinski J.M. J. Phys. Chem. 94:1990;3019.
27. Matsuda A., Goto T. Mat. Res. Soc. Symp. Proc. 164:1990;3.
28. Perrin J., Shiratani M., Kae-Nune P., Videlot H., Jolly J., Guillon J. J. Vac. Sci. Technol. A. 16:1998;278.
29. Fuyuki T., Allain B., Perrin J. J. Appl. Phys. 68:1990;3322.
30. Callear A.B., Hedges R.E.M. Trans. Faraday Soc. 66:1970;605.
31. Callear A.B., Wood P.M. J. Chem. Soc. Faraday Trans. 2:(68):1972;302.
32. Umemoto H., Kasakura A., Kikuma J., Sato S. Bull. Chem. Soc. Jpn. 60:1987;2343.
33. Perrin J., Allain B. Chem. Phys. 123:1988;295.
34. Bras N., Butaux J., El Afghani A., Jeannet J.C., Perrin D. J. Chem. Phys. 89:1988;1469.
35. Sillesen A., Ratajczak E., Pagsberg P. Chem. Phys. Lett. 201:1993;171.