Application of Laser Induced Electron Impact Ionization to the Deposition Chemistry in the Hot-Wire Chemical Vapor Deposition Process with SiH4-NH3 Gas Mixtures

Journal of the American Society for Mass Spectrometry

Volumn 18, Issue 11, 2007, Pages 1950-1958

  Eustergerling, Brett ^a   Hèden, Martin ^a   Shi, Yujun ^a  

^a UNIVERSITY OF CALGARY   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; IONIZATION POTENTIAL; LASER BEAMS; MASS SPECTROMETERS; ULTRAVIOLET RADIATION; VAPOR DEPOSITION;

HOTWIRE CHEMICAL VAPOR DEPOSITION (HWCVD); LASER INDUCED ELECTRON IMPACT; SINGLE-PHOTON IONIZATION (SPI);

SILICON COMPOUNDS;

AMMONIA; HELIUM; HYDROGEN; NITROGEN; SILANE;

ARTICLE; CHEMICAL REACTION; DECOMPOSITION; ELECTRON; FINGER DERMATOGLYPHICS; FRAGMENTATION REACTION; GAS; GAS MIXING; IONIZATION; LASER; LASER INDUCED ELECTRON IMPACT IONIZATION; STEADY STATE; TEMPERATURE; TIME OF FLIGHT MASS SPECTROMETRY; ULTRAVIOLET RADIATION; VAPOR;

EID: 35449001913     PISSN: 10440305     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jasms.2007.08.012     Document Type: Article

References (32)

1. Mahan A.H. An Update on Silicon Deposition Performed by Hot-Wire CVD. Thin Solid Films 501 (2006) 3-7
2. Liu F., Ward S., Gedvilas L., Keyes B., To B., Wang Q., Sanchez E., and Wang S. Amorphous Silicon Nitride Deposited by Hot-Wire Chemical Vapor Deposition. J. Appl. Phys 96 (2004) 2973-2979
3. Gallagher A. Some Physics and Chemistry of Hot-Wire Deposition. Thin Solid Films 395 (2001) 25-28
4. 4 on a Hot Filament. Thin Solid Films 395 (2001) 42-46
5. Doyle J.D., Robertson R., Lin G.H., He M.Z., and Gallagher A. Production of High-Quality Amorphous Silicon Films by Evaporative Silane Surface Decomposition. J. Appl. Phys 64 (1988) 3215-3223
6. Duan H.L., Zaharias G.A., and Bent S.F. Probing Radicals in Hot-Wire Decomposition of Silane Using Single Photon Ionization. Appl. Phys. Lett 78 (2001) 1784-1786
7. van Veenendaal P.A.T.T., and Schropp R.E.I. Processes in Silicon Deposition by Hot-Wire Chemical Vapor Deposition. Curr. Opin. Solid State Mater. Sci 6 (2002) 465-470
8. Holt J.K., Swiatek M., Goodwin D.G., Muller R.F., Goddard III W.A., and Atwater H.A. Gas-Phase and Surface Kinetic Processes in Polycrystalline Silicon Hot-wire Chemical Vapor Deposition. Thin Solid Films 395 (2001) 29-35
9. Nakamura S., and Koshi M. Elementary Processes in Silicon Hot-Wire CVD. Thin Solid Films 501 (2006) 26-30
10. Grosman M., and Löffler D.G. Kinetics of Ammonia Decomposition on Polycrystalline Tungsten. J. Catalysis 80 (1983) 188-193
11. 3 Plasma Processing of Metal and Polymer Substrates. J. Phys. Chem. B 105 (2001) 5957-5967
12. 3 on Heated W Surfaces. Jpn. J. Appl. Phys. Part 1 42 (2003) 5315-5321
13. Stannowski B., Rath J.K., and Schropp R.E.I. Growth Process and Properties of Silicon Nitride Deposited by Hot-wire Chemical Vapor Deposition. J. Appl. Phys 93 (2003) 2618-2625
14. 3 System. Thin Solid Films 430 (2003) 24-27
15. 4 Plasma and their Role in Silicon Nitride Deposition. J. Appl. Phys 100 (2006) 093303-1-093303-10
16. Wang Q., Ward S., Gedvilas L., Keyes B., Sanchez E., and Wang S. Conformal Thin-Film Silicon Nitride Deposited by Hot-wire Chemical Vapor Deposition. Appl. Phys. Lett 84 (2004) 338-340
17. Matsumura H. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method. Jpn. J. Appl. Phys 37 (1998) 3175-3186
18. Shi Y.J., Lo B., Tong L., Li X., Eustergerling B.D., and Sorensen T.S. In situ Diagnostics of the Decomposition of Silacyclobutane on a Hot Filament by Vacuum Ultraviolet Laser Ionization Mass Spectrometry. J. Mass Spectrom 42 (2007) 573-583
19. Li X.M., Eustergerling B.D., and Shi Y.J. Mass Spectrometric Study of Gas-Phase Chemistry in a Hot-Wire Chemical Vapor Deposition Reactor with Tetramethylsilane. Int. J. Mass Spectrom 263 (2007) 233-242
20. Colby S.M., and Reilly J.P. Photoemission Electron Impact Ionization in Time-of-Flight Mass Spectrometry: An Examination of Experimental Consequences. Int. J. Mass Spectrom. Ion Processes 131 (1994) 125-138
21. Mühlberger F., Zimmermann R., and Kettrup A. A Mobile Mass Spectrometer for Comprehensive On-line Analysis of Trace and Bulk Components of Complex Gas Mixtures: Parallel Application of the Laser-Based Ionization Methods VUV Single-Photon Ionization, Resonant Multiphoton Ionization Laser-Induced Electron Impact Ionization. Anal. Chem 73 (2001) 3590-3604
22. Schriemer D.C., and Li L. Laser-Induced Surface Ionization in a Time-of-Flight Mass Spectrometer. Rev. Sci. Instrum 66 (1995) 55-62
23. Cheng P.Y., and Dai H.L. A Photoemitted Electron-Impact Ionization Method for Time-of-Flight Mass Spectrometers. Rev. Sci. Instrum 64 (1993) 2211-2214
24. Rohwer E.R., Beavis R.C., Koster C., Lindner J., Grotemeyer J., and Schlag E.W. Fast Pulsed Laser Induced Electron Generation for Electron Impact Mass Spectrometry. Z. Naturforsch 43a (1988) 1151-1153
25. Boyle J.G., Pfefferle L.D., Gulcicek E.E., and Colson S.D. Laser-Driven Electron Ionization for a VUV Photoionization Time-of-Flight Mass Spectrometer. Rev. Sci. Instrum 62 (1991) 323-333
26. 3 Mixtures. Thin Solid Films 06 (2007) 029
27. Schriemer D.C., and Li L. Surface Analysis of Bulk Polymers Using Laser-Induced Photoelectron Ionization with Laser Desorption in a Time-of-Flight Mass Spectrometer. Anal. Chem 68 (1996) 250-256
28. Melton C.E., and Emmett P.H. Transient Species Observed in the Catalyzed Decomposition of Ammonia. J. Phys. Chem 68 (1964) 3318-3324
29. 2 at Ambient Temperature and Low Pressures. Chem. Phys. Lett 240 (1995) 474-480
30. 2 reaction: Application of Variational Transition-State Theory and Analysis of the Equilibrium Constants and Kinetic Isotope Effects Using Curvilinear and Rectilinear Coordinates. J. Chem. Phys 106 (1997) 4013-4021
31. 3. In: Dabrowski J., and Weber E.R. (Eds). Predictive Simulation of Semiconductor Processing: Status and Challenges (2004), Springer-Verlag, Berlin 295
32. Shi Y.J., Consta S., Das A.K., Mallik B., Lacey D., and Lipson R.H. A 118 nm Vacuum Ultraviolet Laser/Time-of-Flight Mass Spectroscopic Study of Methanol and Ethanol Clusters in the Vapor Phase. J. Chem. Phys 116 (2002) 6990-6999