Observation of electromigration in a Cu thin line by in situ coherent x-ray diffraction microscopy

Journal of Applied Physics

Volumn 105, Issue 12, 2009, Pages

  Takahashi, Yukio ^a   Nishino, Yoshinori ^b   Furukawa, Hayato ^a   Kubo, Hideto ^a   Yamauchi, Kazuto ^a   Ishikawa, Tetsuya ^b   Matsubara, Eiichiro ^c  

^a OSAKA UNIVERSITY   (Japan)

^b RIKEN Harima Institute Research   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERISTIC X RAYS; COHERENT X-RAY DIFFRACTION; IN-SITU; METALLIC MATERIAL; NANO-MATERIALS; STRUCTURAL CHANGE; THERMAL DEFORMATION; X-RAY FREE ELECTRON LASERS;

DEFORMATION; DIFFRACTION GRATINGS; DIFFRACTION PATTERNS; ELECTROMIGRATION; HOLOGRAPHIC INTERFEROMETRY; IMAGE RECONSTRUCTION; NUCLEAR INSTRUMENTATION; STRUCTURAL DYNAMICS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAYS;

X RAY LASERS;

EID: 67650260964     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3151855     Document Type: Conference Paper

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