High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction

Applied Physics Letters

Volumn 80, Issue 20, 2002, Pages 3724-3726

  Tamura, N ^a   MacDowell, A A ^a   Celestre, R S ^a   Padmore, H A ^a   Valek, B ^b   Bravman, J C ^b   Spolenak, R ^c   Brown, W L ^c   Marieb, T ^d   Fujimoto, H ^d   Batterman, B W ^a,e   Patel, J R ^a,e  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Stanford University   (United States)

^c NOKIA RESEARCH CENTER   (United States)

^d INTEL CORPORATION   (United States)

^e SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM THIN FILMS; ELECTRON PROBE; FOCUSING OPTICS; GRAIN ORIENTATION; HIGH SPATIAL RESOLUTION; MECHANICAL BEHAVIOR; POLYCRYSTALLINE THIN FILM; RECENT PROGRESS; STRAIN MAPPING; SUBMICRON; SUBMICRON SPATIAL RESOLUTION; SYNCHROTRON SOURCE; TWO-DIMENSIONAL DETECTORS; X-RAY SYNCHROTRON;

IMAGE RESOLUTION; SYNCHROTRONS; X RAY DIFFRACTION;

THIN FILMS;

EID: 79956030875     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1477621     Document Type: Article

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