Collisionless electron power absorption in capacitive radio-frequency plasma sheaths

Journal of Applied Physics

Volumn 100, Issue 4, 2006, Pages

  Gahan, D ^a   Hopkins, M B ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

CALIBRATION; ELECTRIC POTENTIAL; ELECTRODES; ELECTRON ABSORPTION;

COLLISIONLESS; COUPLED PLASMA REACTOR; ELECTRON POWER ABSORPTION; RADIO FREQUENCY;

PLASMA SHEATHS;

EID: 33748326075     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2245198     Document Type: Article

References (24)

1. A. Godyak, Sov. Phys. Tech. Phys. 16, 1073 (1972).
2. M. A. Lieberman and V. A. Godyak, IEEE Trans. Plasma Sci. 26, 955 (1998).
3. E. Fermi, Phys. Rev. 75, 1169 (1949).
4. M. A. Lieberman, IEEE Trans. Plasma Sci. 16, 638 (1988).
5. M. Surendra and M. Dalvie, Phys. Rev. E 48, 3914 (1993).
6. G. Gozadinos, D. Vender, M. M. Turner, and M. A. Lieberman, Plasma Sources Sci. Technol. 10, 117 (2001).
7. M. M. Turner, Phys. Rev. Lett. 75, 1312 (1995).
8. G. Gozadinos, M. M. Turner, and D. Vender, Phys. Rev. Lett. 87, 135004 (2001).
9. I. D. Kaganovich, Phys. Rev. Lett. 89, 265006 (2002).
10. F. Soberón and A. R. Ellingboe, Contrib. Plasma Phys. 44, 629 (2004).
11. V. A. Godyak and R. B. Piejak, J. Appl. Phys. 68, 3157 (1990).
12. P. J. Hargis et al., Rev. Sci. Instrum. 65, 140 (1994).
13. M. A. Sobolewski, J. Vac. Sci. Technol. A 10, 3550 (1992).
14. M. A. Sobolewski, IEEE Trans. Plasma Sci. 23, 1006 (1995).
15. N. Spiliopoulos, D. Mataras, and D. E. Rapakoulias, J. Vac. Sci. Technol. A 14, 2757 (1996).
16. C. M. O. Mahony, P. D. Maguire, and W. G. Graham, Plasma Sources Sci. Technol. 14, S60 (2005).
17. P. A. Miller and M. E. Riley, J. Appl. Phys. 82, 3689 (1997).
18. J. R. Woodworth, I. C. Abraham, M. E. Riley, P. A. Miller, T. W. Hamilton, B. P. Aragon, R. J. Shul, and C. G. Wilson, J. Vac. Sci. Technol. A 20, 873 (2002).
19. M. A. Sobolewski, J. K. Olthoff, and Y. Wang, J. Appl. Phys. 85, 3966 (1999).
20. M. A. Sobolewski, Phys. Rev. E 59, 1059 (1999).
21. K. Kohler, J. W. Coburn, D. E. Home, and E. Kay, J. Appl. Phys. 57, 59 (1985).
22. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
23. M. A. Sobolewski, Appl. Phys. Lett. 70, 1049 (1997).
24. V. A. Godyak, R. B. Pejak, and B. M. Alexandrovich, J. Appl. Phys. 69, 3455 (1991).