Metallic sputtering growth of high quality anatase phase TiO2 films by inductively coupled plasma assisted DC reactive magnetron sputtering

Surface and Coatings Technology

Volumn 203, Issue 23, 2009, Pages 3661-3668

  Li, Z G ^a   Wu, Y X ^a   Miyake, S ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b KINKI UNIVERSITY   (Japan)

Author keywords

Anatase thin films; Crystallinity; Inductively coupled plasma; Metallic mode; Reactive magnetron sputtering

Indexed keywords

ANATASE PHASE; ANATASE THIN FILMS; BULK ANATASE; CRYSTALLINITY; DC REACTIVE MAGNETRON SPUTTERING; DEGREE OF CRYSTALLINITY; DIRECT CURRENT; FILM STRUCTURE; GLASS SUBSTRATES; HIGH DEPOSITION RATES; HIGH QUALITY; HIGH TRANSMITTANCE; LATTICE SPACING; METALLIC MODE; OXYGEN PARTIAL PRESSURE; OXYGEN STOICHIOMETRY; REACTIVE MAGNETRON SPUTTERING; RF-POWER; SPUTTERING GROWTH; STANDARD VALUES; TIO; UV-VIS SPECTROPHOTOMETERS; VISIBLE REGION;

ARGON; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; ORGANIC POLYMERS; OXYGEN; PHOTORESISTS; STOICHIOMETRY; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL FILMS;

EID: 67649359303     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.06.001     Document Type: Article

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