Metallic sputtering growth of crystalline titanium oxide films on unheated glass substrate using inductively coupled plasma assisted direct current magnetron sputtering

Thin Solid Films

Volumn 517, Issue 2, 2008, Pages 699-703

  Li, Z G ^a,b   Miyake, S ^c   Makino, M ^d   Wu, Y X ^a,b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b Shanghai Jiao Tong University   (China)

^c KINKI UNIVERSITY   (Japan)

^d OSAKA UNIVERSITY   (Japan)

Author keywords

Deposition rate; Inductively coupled plasma; Magnetron sputtering; Titanium oxide

Indexed keywords

AMORPHOUS MATERIALS; ARGON; CRYSTALLINE MATERIALS; GLASS; INDUCTIVELY COUPLED PLASMA; INERT GASES; INJECTION (OIL WELLS); MAGNETRONS; METALLIC COMPOUNDS; METALLIC GLASS; METALLIC SOAPS; OXIDE FILMS; OXIDE MINERALS; OXYGEN; PHOTORESISTS; PLASMA DEPOSITION; PLASMAS; SUBSTRATES; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

AMORPHOUS; CRYSTALLINE TITANIUMS; CRYSTALLINITY; CRYSTALLIZED STRUCTURES; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRON DENSITIES; GAS INJECTIONS; OXIDE MODES; OXYGEN FLUXES; PARTIAL PRESSURE OF OXYGENS; POLYCRYSTALLINE; RADIO FREQUENCIES; RUTILE AND ANATASES; SPUTTERING GROWTHS; TEMPERATURE GROWTHS; TOTAL PRESSURES; UNHEATED GLASS SUBSTRATES;

MAGNETRON SPUTTERING;

EID: 55049128217     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.128     Document Type: Article

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