Sputtering pressure dependent photocatalytic properties of TiO2 thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1161-1165

  Takahashi, T ^a   Prabakar, K ^a   Nezuka, T ^a   Yamazaki, T ^a   Nakashima, T ^b   Kubota, Y ^c   Fujishima, A ^d  

^a UNIVERSITY OF TOYAMA   (Japan)

^b Kashiwa Chuo High School   (Japan)

^c YOKOHAMA CITY UNIVERSITY   (Japan)

^d KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY GAP; PHOTOCATALYSIS; SPUTTERING; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

BAND GAP ENERGY; PHOTOCATALYTIC PROPERTIES; SPUTTER DEPOSITION PROCESSES; SPUTTERING PRESSURE;

METALLIC FILMS;

EID: 33745505589     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2187984     Document Type: Article

References (23)

1. K. Honda and A. Fujishima, Nature (London) 238, 37 (1972).
2. M. Radecka, Thin Solid Films 451-452, 98 (2004).
3. R. Krol, A. Goossens, and J. Schoonman, J. Electrochem. Soc. 144, 1723 (1997).
4. A. Mills and S. Le Hunte, J. Photochem. Photobiol., A 108, 1 (1997).
5. M. Radecka, K. Zakrzewska, M. Wierzbicka, A. Gorzkowska, and S. Komornicki, Solid State Ionics 157, 379 (2003).
6. A. Fujishima, T. N. Rao, and D. A. Tryk, J. Photochem. Photobiol. C 1, 1 (2000).
7. H. Tada, M. Akazawa, Y. Kubo, and S. Ito, J. Phys. Chem. B 102, 6360 (1998).
8. M. Anpo, H. Yamashita, Y. Ichihashi, Y. Fujii, and M. Honda, J. Phys. Chem. B 101, 2632 (1997).
9. S. Sato, K. Ueda, Y. Kawasaki, and R. Nakamura, J. Phys. Chem. B 106, 9054 (2002).
10. W. Cui, L. Feng, C. Xu, S. Lu, and F. Qiu, Catal. Commun. 5, 533 (2004).
11. Z. Y. Zhou, N. Tian, Y. J. Chen, S. P. Chen, and S. G. Sun, J. Electroanal. Chem. 573, 111 (2004).
12. R. Nakamura and S. Sato, J. Phys. Chem. B 102, 5893 (2002).
13. J. M. Kesselman, O. W. Nathan, S. Lewis, and M. R. Hoffmann, J. Phys. Chem. B 101, 2637 (1997).
14. T. Sano, N. Negishi, K. Uchino, J. Tanaka, S. Matsuzawa, and K. Takeuchi, J. Photochem. Photobiol., A 160, 93 (2003).
15. P. K. Song, Y. Shigesato, M. Kamei, and I. Yasui, Jpn. J. Appl. Phys., Part 1 38, 2921 (1999).
16. K. Okimura, A. Shibata, N. Maeda, K. Tachibana, Y. Noguchi, and K. Tshuchida, Jpn. J. Appl. Phys., Part 1 34, 4950 (1995).
17. P. Barquinha, L. Pereira, H. Aguas, E. Fortunato, and R. Martins, Mater. Sci. Semicond. Process. 7, 243 (2004).
18. N. Martin, C. Rousselot, C. Savall, and F. Palmino, Thin Solid Films 287, 154 (1996).
19. I. G. Martyanov, S. Uma, S. Rodrigues, and K. J. Klanunde, Chem. Commun. (Cambridge) 2004, 2476.
20. T. Iwasita and F. C. Nart, J. Electroanal. Chem. Interfacial Electrochem. 317, 291 (1991).
21. J. Greeley and M. Mavrikakis, J. Am. Chem. Soc. 126, 3912 (2004).
22. M. Manzoli, A. Chiorino, and F. Boccuzzi, Appl. Catal., B 57, 201 (2004).
23. J. Greeley and M. Mavrikakis, J. Catal. 208, 291 (2002).