Influence of argon flow rate on TiO2 photocatalyst film deposited by dc reactive magnetron sputtering

Surface and Coatings Technology

Volumn 182, Issue 2-3, 2004, Pages 192-198

  Zhang, Wenjie ^a   Li, Ying ^a   Zhu, Shenglong ^a   Wang, Fuhui ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Argon; Photocatalytic activity; Reactive sputtering; Titanium oxide

Indexed keywords

DEPOSITION; LIGHT ABSORPTION; MAGNETRON SPUTTERING; PHOTOCATALYSIS; TITANIUM DIOXIDE;

ARGON FLOW RATE; FILM DEPOSITION;

PROTECTIVE COATINGS;

COATING; FILM; FLOW; SPUTTERING; TITANIUM OXIDE;

EID: 2142756812     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.08.050     Document Type: Article

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