Influence of oxygen flow ratio on the oxidation of Ti target and the formation process of TiO2 films by reactive sputtering

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 397-401

  Takamura, K ^a   Abe, Y ^a   Sasaki, K ^a  

^a KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Formation process; Reactive sputtering; Target oxidation; Ti; TiO2

Indexed keywords

DENSITY (SPECIFIC GRAVITY); HYSTERESIS; METALLIC FILMS; OPTICAL MATERIALS; OXIDATION; PERMITTIVITY; PHOTOCATALYSIS; REFRACTIVE INDEX; SPUTTERING;

FORMATION PROCESSES; OXYGEN FLOW RATIOS; REACTIVE SPUTTERING; TARGET OXIDATION;

TITANIUM DIOXIDE;

EID: 2442507532     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.006     Document Type: Article

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