Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 183-188

  Heo, Cheol Ho ^a   Lee, Soon Bo ^a   Boo, Jin Hyo ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Deposition parameter effects; Phase transition; RF magnetron sputtering; TiO2 thin film

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL STRUCTURE; EVAPORATION; GLASS; MAGNETRON SPUTTERING; NATURAL FREQUENCIES; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; REFRACTIVE INDEX; SURFACE TREATMENT; THERMAL EFFECTS; THIN FILMS;

DEPOSITION PARAMETER EFFECTS; GLASS SUBSTRATES; RF MAGNETRON SPUTTERING; TIO2 THIN FILMS;

TITANIUM DIOXIDE;

EID: 13444263510     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.033     Document Type: Conference Paper

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