Study of photocatalytic activity of TiO2 thin films prepared in various Ar O2 ratio and sputtering gas pressure

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 912-916

  Biswas, S ^a   Prabakar, K ^a   Takahashi, T ^a   Nakashima, T ^b   Kubota, Y ^c   Fujishima, A ^d  

^a UNIVERSITY OF TOYAMA   (Japan)

^b Kashiwa Chuo High School   (Japan)

^c YOKOHAMA CITY UNIVERSITY   (Japan)

^d KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CATALYST ACTIVITY; FILM PREPARATION; OPTICAL PROPERTIES; OXYGEN; PHOTOCATALYSIS; REACTIVE SPUTTERING; TITANIUM DIOXIDE;

SPUTTERING GAS PRESSURE; SPUTTERING PRESSURE;

THIN FILMS;

EID: 34547284829     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2717194     Document Type: Article

References (24)

1. K. Honda and A. Fujishima, Nature (London) 238, 37 (1972).
2. M. Radecka, Thin Solid Films 451-452, 98 (2004).
3. R. Krol, A. Goossens, and J. Schoonman, J. Electrochem. Soc. 144, 1723 (1997).
4. P. Zeman and S. Takabayashi, Thin Solid Films 433, 57 (2003).
5. J. S. Kim, H. K. Joo, and T. K. Lee, J. Catal. 194, 484 (2000).
6. K. Ro, W. Park, G. Choe, and J. Ahn, Korean J. Mater. Res. 7, 21 (1997).
7. S. K. Zheng, T. M. Wang, G. Xiang, and C. Wang, Vacuum 62, 361 (2001).
8. T. M. Wang, H. Y. Wang, and P. Xu, Thin Solid Films 334, 103 (1998).
9. S. Takeda, S. Suzuki, and H. Odaka, Thin Solid Films 392, 338 (2001).
10. A. Fukushima, K. Hashimoto, and T. Watanabe, Ti O2 Photocatalysis: Fundamentals and Applications (BKC, Tokyo, 1999), p. 124.
11. Seon-Hwa Kim, Yong-Lak Choi, Yo-Seung Song, Deuk Yong Lee, and Se-Jong Lee, Mater. Lett. 57, 343 (2002).
12. N. Martine, A. M. E. Santo, R. Sanjines, and F. Levy, Surf. Coat. Technol. 138, 77 (2001).
13. K. Okimura, A. Shibata, N. Maeda, K. Tachibana, Y. Noguchi, and K. Tsuchida, Jpn. J. Appl. Phys., Part 1 34, 4950 (1995).
14. A. Shibata, K. Okimura, Y. Yamamoto, and K. Matubara, Jpn. J. Appl. Phys., Part 1 32, 5666 (1993).
15. R. Gouttebaron, D. Cornelissen, and R. Snyders, Surf. Interface Anal. 30, 527 (2000).
16. A. Caballero, D. Leinen, A. Fernandez, A. Justo, and J. P. Espinos, J. Appl. Phys. 77, 591 (1995).
17. A. L. Linsebigler, G. Q. Lu, and J. T. Yates, Chem. Rev. (Washington, D.C.) 95, 735 (1995).
18. P. Barquinha, L. Pereira, H. Aguas, E. Fortunato, and R. Martins, Mater. Sci. Semicond. Process. 7, 243 (2004).
19. K. Prabakar, T. Takahashi, T. Nakashima, Y. Kubota, and A. Fujishima, J. Vac. Sci. Technol. A 24, 1613 (2006).
20. J. Greeley and M. Mavrikakis, J. Am. Chem. Soc. 126, 3912 (2004).
21. S. Takeda, S. Suzuki, H. Odaka, H. Hosono, Proceedings of the Third International Conference on Coatings and Glass, 2000 (unpublished), p. 707.
22. A. P. Xagas, E. Androulaki, A. Hiskia, and P. Falaras, Thin Solid Films 357, 173 (1999).
23. A. I. Kontos, I. M. Arabatzis, D. S. Tsoukleris, A. G. Kontos, M. C. Bernard, D. E. Petrakis, and P. Falaras, Catal. Today 101, 275 (2005).
24. Makiko Yamagishi, Sina Kuriki, P. K. Song, and Yuzo Shigesato, Thin Solid Films 442, 227 (2003).