Preparation of anatase and rutile thin films by controlling oxygen partial pressure

Applied Surface Science

Volumn 193, Issue 1-4, 2002, Pages 287-292

  Syarif, Dani Gustaman ^a,b   Miyashita, Atsumi ^a   Yamaki, Tetsuya ^a   Sumita, Taishi ^a   Choi, Yeongsoo ^a   Itoh, Hisayoshi ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b NATIONAL NUCLEAR ENERGY AGENCY   (Indonesia)

Author keywords

Atomic force microscope; Photocatalytic activity; Pulsed laser ablation; Titanium dioxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ATOMIC STRUCTURE; GLASS; MORPHOLOGY; OXYGEN; PARTIAL PRESSURE; PHOTOCATALYSIS; PULSED LASER DEPOSITION; THIN FILMS; ULTRAVIOLET SPECTROPHOTOMETERS; X RAY DIFFRACTION ANALYSIS;

PHOTOCATALYTIC ACTIVITIES;

SURFACE ROUGHNESS;

EID: 0037024018     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00532-9     Document Type: Article

References (25)