SCOPUS 정보 검색 플랫폼

Chinese Physics

Volumn 15, Issue 6, 2006, Pages 1320-1324

Effect of substrate temperature and pressure on properties of microcrystalline silicon films

(6) Wu, Zhi Meng a Lei, Qing Song a Geng, Xin Hua b Zhao, Ying b Sun, Jian b Xi, Jian Ping a

a SHANGHAI JIAO TONG UNIVERSITY (China)

b NANKAI UNIVERSITY (China)

Author keywords

Microcrystalline silicon; Raman spectra; SEM; VHF PECVD

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; THERMAL EFFECTS;

MICROCRYSTALLINE SILICON; SUBSTRATE TEMPERATURE; TRANSMITTANCE MEASUREMENTS; VHF-PECVD;

SEMICONDUCTING FILMS;

EID: 33746659121 PISSN: 10091963 EISSN: 17414199 Source Type: Journal
DOI: 10.1088/1009-1963/15/6/031 Document Type: Article

Times cited : (8)

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