On-tip sub-micrometer Hall probes for magnetic microscopy prepared by AFM lithography

Ultramicroscopy

Volumn 109, Issue 8, 2009, Pages 1080-1084

  Gregusova D ^a   Martaus, J ^a   Fedor, J ^a   Kudela R ^a   Kostic I ^b   Cambel, V ^a  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b INSTITUTE OF CHEMISTRY   (Slovakia)

Author keywords

Hall probe; Heterostructure; Local anodic oxidation; Non planar photolithography

Indexed keywords

ACTIVE AREA; ACTIVE LAYER; AFM LITHOGRAPHY; ATOMIC FORCE MICROSCOPES; FUTURE APPLICATIONS; GAAS; HALL-PROBE; HETEROSTRUCTURE; HIGH-ASPECT RATIO; LOCAL ANODIC OXIDATION; MAGNETIC FIELD SENSITIVITY; MAGNETIC MICROSCOPY; NON-PLANAR PHOTOLITHOGRAPHY; PLANAR LITHOGRAPHY; SCANNING HALL PROBE MICROSCOPY; SUBMICROMETER; WET-CHEMICAL ETCHING;

ASPECT RATIO; MAGNETIC FIELDS; MAGNETIC FORCE MICROSCOPY; MICROMETERS; MOS CAPACITORS; PROBES;

ANODIC OXIDATION;

ALUMINUM; GALLIUM; GALLIUM ARSENIDE; INDIUM; PHOSPHORUS;

ARTICLE; ATOMIC FORCE MICROSCOPY; CONTROLLED STUDY; ELECTRON BEAM; ELECTRON MICROSCOPY; MAGNETIC FIELD; MAGNETIC FORCE MICROSCOPY; MOLECULAR PROBE; OXIDATION; ROOM TEMPERATURE; SCANNING HALL PROBE MICROSCOPY; SEMICONDUCTOR;

EID: 67449110723     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.03.018     Document Type: Article

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