Technology and properties of a vector hall sensor

Microelectronics Journal

Volumn 37, Issue 12, 2006, Pages 1543-1546

  Gregusova D ^a   Elias P ^a   Oszi, Z ^a   Kudela R ^a   Soltys J ^a   Fedor, J ^a   Cambel, V ^a   Kostic I ^b  

^a INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^b INSTITUTE OF INFORMATICS   (Slovakia)

Author keywords

GaAs; Hall probe; Non planar photolithography; OMVPE; Vector magnetic field sensor

Indexed keywords

ETCHING; HETEROJUNCTIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLORGANIC VAPOR PHASE EPITAXY; OPTIMIZATION; SEMICONDUCTING GALLIUM ARSENIDE; SENSITIVITY ANALYSIS; VECTOR QUANTIZATION;

GAAS; HALL PROBES; NON PLANAR PHOTOLITHOGRAPHY; VECTOR MAGNETIC FIELD SENSORS;

SENSORS;

EID: 33750744804     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2006.05.017     Document Type: Article

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