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Volumn 108, Issue 10, 2008, Pages 1021-1024
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Local anodic oxidation by AFM tip developed for novel semiconductor nanodevices
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Author keywords
Atomic force microscope; Computer simulations; Local anodic oxidation; Mesoscopic and nanoscale systems; Nanooxidation
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL OXYGEN DEMAND;
ELECTRIC CONDUCTIVITY;
ELECTRIC FIELD EFFECTS;
ELECTRIC FIELDS;
ELECTROMAGNETIC FIELD THEORY;
ELECTROMAGNETIC FIELDS;
ELECTRON GAS;
ENERGY BARRIERS;
EXTREME ULTRAVIOLET LITHOGRAPHY;
HETEROJUNCTIONS;
IMAGING TECHNIQUES;
MOS CAPACITORS;
NANOSTRUCTURED MATERIALS;
OPTICAL DESIGN;
OXIDATION;
SEMICONDUCTOR MATERIALS;
TECHNOLOGY;
2-D ELECTRON GAS;
ATOMIC FORCE MICROSCOPE;
CA-P LAYER;
COMPUTER SIMULATIONS;
DOPING LAYERS;
ELECTRIC FIELD DISTRIBUTIONS;
ENERGY-BARRIER;
HETERO STRUCTURES;
HIGH-ENERGY BARRIERS;
LOCAL ANODIC OXIDATION;
LOW-TEMPERATURE APPLICATIONS;
MESOSCOPIC AND NANOSCALE SYSTEMS;
MONTE CARLO;
NANOMETER-SCALED STRUCTURES;
NANOOXIDATION;
OXIDE LINES;
SEMICONDUCTOR HETEROSTRUCTURES;
SEMICONDUCTOR NANODEVICES;
TIP APEX;
ANODIC OXIDATION;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
ELECTRIC FIELD;
LOW TEMPERATURE;
MONTE CARLO METHOD;
NANODEVICE;
OXIDATION;
ROOM TEMPERATURE;
SEMICONDUCTOR;
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EID: 49949100059
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2008.04.032 Document Type: Article |
Times cited : (9)
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References (19)
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