Fabrication of densely distributed Si nanorods by Ar+-ion bombardment

Surface Science

Volumn 600, Issue 18, 2006, Pages 3668-3672

  Tanemura, Masaki ^a   Kobayashi, M ^a   Kudo, M ^a   Yamauchi, H ^a   Okita, T ^a   Miao, L ^a   Tanemura, S ^a  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Cone; Mo; Nanostructure; Seed; Si

Indexed keywords

ARGON; HIGH TEMPERATURE OPERATIONS; ION BEAMS; ION BOMBARDMENT; MOLYBDENUM; POSITIVE IONS; SILICON; SPUTTER DEPOSITION;

NANOCONES; NANOELECTRONICS; NANORODS; SPUTTERING TEMPERATURE;

NANOSTRUCTURED MATERIALS;

EID: 33748923484     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.01.070     Document Type: Article

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