Dynamics of debris from laser-irradiated Sn droplet for EUV lithography light source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7201, Issue , 2009, Pages

  Okazaki, K ^a   Nakamura, D ^a   Akiyama, T ^a   Toya, K ^a   Takahashi, A ^a   Okada, T ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

Debris; Droplet; Extreme ultraviolet; Fast ions; Laser produced plasma

Indexed keywords

13.5 NM; DEBRIS MITIGATION; DENSE PARTICLES; DOUBLE PULSE; DOUBLE-PULSE IRRADIATION; DROPLET; EUV LITHOGRAPHY; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLET LIGHT SOURCES; FAST IONS; HIGH SPEED IMAGING; KINETIC BEHAVIOR; LASER-INDUCED FLUORESCENCE IMAGING; MITIGATION SYSTEMS; ND : YAG LASERS; OPTIMUM DESIGNS; PLASMA EXPANSION; PREPULSE; PULSE IRRADIATION; REACTION FORCES;

ATOMS; CONVERSION EFFICIENCY; DEBRIS; DROP FORMATION; DYNAMICS; IRRADIATION; LASER PRODUCED PLASMAS; LASER PULSES; LASERS; LIGHT; LIGHTING; NEODYMIUM; PULSED LASER APPLICATIONS; TARGETS; TIN; ULTRAVIOLET DEVICES;

NEODYMIUM LASERS;

EID: 65649121950     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.807525     Document Type: Conference Paper

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