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Volumn 89, Issue 11, 2006, Pages

Mitigation of fast ions from laser-produced Sn plasma for an extreme ultraviolet lithography source

c NONE

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET (EUV) EMISSIONS; FULL DENSITY SOLID SURFACESS; ION ENERGY; LOW ENERGY PREPULSE;

ELECTROMAGNETIC WAVE EMISSION; IONS; LASER PRODUCED PLASMAS; LASERS; LITHOGRAPHY; ULTRAVIOLET RADIATION;

TIN;

EID: 33748678944 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.2349831 Document Type: Article

Times cited : (22)

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