Magnetic field ion mitigation for EUV light sources

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 859-866

  Komori, Hiroshi ^a   Imai, Yousuke ^a   Soumagne, Georg ^a   Abe, Tamotsu ^a   Suganuma, Takashi ^a   Endo, Akira ^a  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

Author keywords

Collector mirror damage; EUV light source; Fast ion mitigation; Laser produced plasma; Xenon ion

Indexed keywords

EROSION; LASER BEAM EFFECTS; LASER PRODUCED PLASMAS; MAGNETIC FIELD EFFECTS; QUARTZ; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

COLLECTOR MIRROR DAMAGE; EUV LIGHT SOURCES; FAST ION MITIGATION; XENON ION;

LIGHT SOURCES;

EID: 24644518517     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600360     Document Type: Conference Paper

References (13)

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