Enhancement of conversion efficiency of extreme ultraviolet radiation from a liquid aqueous solution micro jet target by use of dual laser pulses

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 II, Issue , 2006, Pages

  Higashiguchi, Takeshi ^a   Dojyo, Naoto ^a   Hamada, Masaya ^a   Kawasaki, Keita ^a   Sasaki, Wataru ^b   Kubodera, Shoichi ^a  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b NTP Inc   (Japan)

Author keywords

Extreme ultraviolet (EUV) emission; Laser produced plasma (LPP); Liquid jet targets

Indexed keywords

DEBRIS; LASER PRODUCED PLASMAS; LASER PULSES; NANOSTRUCTURED MATERIALS; SOLUTIONS; TIN COMPOUNDS;

EXTREME ULTRAVIOLET (EUV) EMISSION; LIQUID JET TARGETS; LIQUID MICROJET TARGET; PLASMA CONTROL;

ULTRAVIOLET RADIATION;

EID: 33745618947     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.659162     Document Type: Conference Paper

References (10)

1. C. Gwyn, D. Attwood, and D. Sweeny, "Extreme ultraviolet lithography," J. Vac. Sci. Technonol. B 16, pp. 3142-3149, 1998.
2. L. Rymell and H. M. Hertz, "Droplet target for low debris laser-plasma soft X-ray generation," Opt. Commun. 103, pp. 105-110, 1993.
3. M. Richardson, C.-S. Koay, K. Takenoshita, C. Keyser, and M. Al-Rabban, "High conversion efficiency mass-limited Sn-based laser plasma source for extreme ultraviolet lithography," J. Vac. Sci. Technonol. B 22, pp. 785-790,2004.
4. P. A. C. Jansson, B. A. M. Hansson, O. Hemberg, M. Otendal, A. Hohnberg, J. de Groot, and H. M. Hertz, "Liquid-tin-jet laser-plasma extreme ultraviolet generation," Appl. Phys. Lett. 84, pp. 2256- 2258,2004.
5. J. White, P. Hayden, P. Dunne, A. Cummings, N. Murphy, P. Sheridan, and G. O'Sullivan, "Simplified modeling of 13.5 nm unresolved transition array emission of a Sn plasma and comparison with experiment," J. Appl. Phys. 98, pp. 113301, 2005.
6. G. O'Sullivan and R. Faulkner, "Tunable narrowband soft x-ray source for projection lithography," Opt. Eng. 33, pp. 3978-3983, 1994.
7. Y. Tao, H. Nishimura, S. Fujioka, A. Sunahara, M. Nakai, T. Okuno, N. Ueda, K. Nishihara, N. Miyanaga, and Y. Izawa, "Characterization of density profile of laser-produced Sn plasma for 13.5 nm extreme ultraviolet source," Appl. Phys. Lett. 86, pp. 201501, 2005.
8. D. T. Attwood, Soft X-Rays and Extreme Ultraviolet Radiation, Cambridge University Press, Cambridge, 2000, Chap. 6.
9. C. Rajyaguru, T. Higashiguchi, M. Koga, K. Kawasaki, M. Hamada, N. Dojyo, W. Sasaki, and S. Kubodera, "Parametric optimization of a narrow-band 13.5-nm emission from a Li-based liquid-jet target using dual nano-second laser pulses," Appl. Phys. B 80, pp. 409-412, 2005.
10. T. Higashiguchi, C. Rajyaguru, S. Kubodera, W. Sasaki, N. Yugami, T. Kikuchi, S. Kawata, and A. Andreev, "Efficient soft x-ray emission source at 13.5 nm by use of a femtosecond-laser-produced Li-based microplasma," Appl. Phys. Lett. 86, pp. 231502, 2005.