Development of a target for laser-produced plasma EUV light source using Sn nano-particles

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1493-1495

  Tanaka, H ^a   Akinaga, K ^a   Takahashi, A ^a   Okada, T ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE; CARRIER CONCENTRATION; DATA ACQUISITION; NANOSTRUCTURED MATERIALS; OPTIMIZATION; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; TIN; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS; XENON;

DEBRIS-FREE TARGETS; GAS JET TARGETS; NANO PARTICLES; PIN PHOTODIODES;

LASER PRODUCED PLASMAS;

EID: 4344629437     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2828-2     Document Type: Conference Paper

References (3)

1. F. Gilleron, M. Poirier, T. Blenski, M. Schmidt, T. Ceccotti: J. Appl. Phys. 94, 2086 (2003)
2. G. Schriever, U. Stamm, K. Gabel, M. Darscht, V. Borisov, O. Khristoforov, A. Vinokhodov: Microelectron. Eng. 61-62, 83 (2002)
3. R.K. Singh, D. Bhattacharya, J. Narayan: Appl. Phys. Lett. 57, 2022 (1990)