Efficient extreme ultraviolet plasma source generated by a CO2 laser and a liquid xenon microjet target

Applied Physics Letters

Volumn 90, Issue 19, 2007, Pages

  Ueno, Yoshifumi ^a   Ariga, Tatsuya ^a   Soumagne, George ^a   Higashiguchi, Takeshi ^c   Kubodera, Shoichi ^d   Pogorelsky, Igor ^b   Pavlishin, Igor ^b   Stolyarov, Daniil ^b   Babzien, Marcus ^b   Kusche, Karl ^b   Yakimenko, Vitaly ^b  

^a Extreme Ultra Violet Lithography System Development Association   (Japan)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c UTSUNOMIYA UNIVERSITY   (Japan)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

CARBON DIOXIDE LASERS; CONVERSION EFFICIENCY; LASER PULSES; XENON;

EXTREME ULTRAVIOLET (EUV) SPECTRAL REGION; MICROJETS; PULSE WIDTHS; YTTRIUM ALUMINUM GARNET LASERS;

LASER PRODUCED PLASMAS;

EID: 34248370183     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2738190     Document Type: Article

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