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Journal of the Korean Physical Society

Volumn 54, Issue 4, 2009, Pages 1564-1568

Oxide defects of Laser-spike-annealed ultrathin Hafnium-oxide High-k dielectric stacks

(5) Park, Joon Won a Kim, Dong Hak a Chung, Haeyang a Lim, D a Chang, You Min b

a Kyung Hee University (South Korea)

b FST Co (South Korea)

Author keywords

Hafnium oxide; High k dielectric; Laser annealing

Indexed keywords

EID: 65649092981 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: 10.3938/jkps.54.1564 Document Type: Article

Times cited : (2)

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