Comparison of the deposition characteristics and electrical properties for La2O3, HfO2 and LHO films

Journal of the Korean Physical Society

Volumn 53, Issue 6, 2008, Pages 3334-3337

  Kim, Woong Sun ^a   Park, Sang Kyun ^a   Moon, Dae Yong ^a   Kim, Tae Sub ^a   Kang, Byoung Woo ^a   Seo, Jin Kyo ^a   Kim, Heon Do ^a   Park, Jong Wan ^a  

^a Hanyang University   (South Korea)

Author keywords

Atomic layer deposition; Hafnium oxide (HfO 2); High k oxide; Lanthanum hafnium oxide (LHO); Lanthanum oxide (La2O3); Rare earth oxide

Indexed keywords

EID: 58249102069     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.53.3334     Document Type: Article

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