Nonequilibrium radio frequency plasma interacting with a surface

Plasma Sources Science and Technology

Volumn 18, Issue 1, 2009, Pages

  Makabe, Toshiaki ^a   Yagisawa, Takashi ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE SPECIES; BULK PLASMAS; CAPACITIVELY COUPLED PLASMAS; ETCH RATES; FEED GAS; ION SHEATHS; LOW FREQUENCIES; NON EQUILIBRIUMS; PATTERN SIZES; QUANTUM STRUCTURES; RADIO-FREQUENCY PLASMAS; VERY HIGH FREQUENCIES; WAFER SURFACES;

INDUCTIVELY COUPLED PLASMA; PLASMA SHEATHS; SILICON COMPOUNDS; VELOCITY DISTRIBUTION;

VELOCITY CONTROL;

EID: 65549171577     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/1/014016     Document Type: Article

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