Penetration of plasma into the wafer-focus ring gap in capacitively coupled plasmas

Journal of Applied Physics

Volumn 101, Issue 11, 2007, Pages

  Babaeva, Natalia Y ^a   Kushner, Mark J ^a  

^a Iowa State University of Science and Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL METHODS; FLUXES; PLASMA ETCHING; SILICON WAFERS; THIN FILMS;

CAPACITIVELY COUPLED PLASMAS; RING GAP; WAFER FOCUS RING GAP; WAFER TERMINATING STRUCTURES;

INDUCTIVELY COUPLED PLASMA;

EID: 34250676984     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2736333     Document Type: Article

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