Surface and optical analysis of SiCx films prepared by RF-RMS technique

Diamond and Related Materials

Volumn 15, Issue 1, 2006, Pages 71-79

  Mahmood, A ^a   Muhl, S ^b   MacHorro, R ^c   Lousa, A ^d   Esteve, J ^d   Heiras, J ^c  

^a PAKISTAN INSTITUTE OF NUCLEAR SCIENCE AND TECHNOLOGY   (Pakistan)

^b INSTITUTO DE INVESTIGACIONES EN MATERIALES   (Mexico)

^c CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA   (Mexico)

^d UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Ellipsometry; Optical properties; Silicon carbide; Surface analysis; Thin films; XPS

Indexed keywords

ELLIPSOMETRY; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SILICON CARBIDE; SURFACE PHENOMENA; X RAY PHOTOELECTRON SPECTROSCOPY;

BAND GAP; OPTICAL ANALYSIS; SURFACE ANALYSIS;

THIN FILMS;

EID: 29244475753     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.07.006     Document Type: Article

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