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Review of Scientific Instruments

Volumn 79, Issue 7, 2008, Pages

Direct-current cathodic vacuum arc system with magnetic-field mechanism for plasma stabilization

(2) Zhang, H S a Komvopoulos, K a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; BEAM PLASMA INTERACTIONS; CARBON FILMS; CAVITY RESONATORS; CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; ELECTROMAGNETIC FIELDS; ELECTROMAGNETISM; MAGNETIC FIELD EFFECTS; MAGNETIC FIELD MEASUREMENT; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETISM; MAGNETOHYDRODYNAMICS; MECHANISMS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; VACUUM; VACUUM APPLICATIONS; VACUUM DEPOSITION; VACUUM TECHNOLOGY;

AMORPHOUS CARBON (A-C); CATHODIC VACUUM ARCS; DC ARC DISCHARGES; DC MODE; DIRECT CURRENT; DIRECT CURRENTS; FILM DEPOSITION; FILTERED CATHODIC VACUUM ARC; HIGH HARDNESS; MACRO PARTICLES; MACROPARTICLE FILTERING; OUT-OF PLANE; PLASMA BEAMS; PLASMA ENERGY; PLASMA INSTABILITIES; PLASMA STABILIZATION; PULSED ARCS; PULSED MODES; SUBSTRATE BIASING; SUBSTRATE TEMPERATURE; TETRAHEDRAL CARBON;

PLASMA STABILITY;

EID: 49149122817 PISSN: 00346748 EISSN: None Source Type: Journal
DOI: 10.1063/1.2949128 Document Type: Article

Times cited : (57)

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