The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Jeong, Chang Young ^a   Kim, Byung Hun ^a   Kim, Tae Geun ^a   Lee, Sangsul ^a   Kim, Eun Jin ^a   Oh, Hye Keun ^a   Park, In Sung ^a   Ahn, Jinho ^a  

^a Hanyang University   (South Korea)

Author keywords

Aerial image; Attenuated PSM; EUVL; Horizontal vertical CD bias; Shadowing effect

Indexed keywords

ABSORBER STACKS; AERIAL IMAGE SIMULATION; AERIAL IMAGES; ATTENUATED PHASE SHIFT MASKS; ATTENUATED PSM; BIAS VARIATION; BINARY MASKS; CD BIAS; CRITICAL DIMENSION; DEEP ULTRAVIOLET; DEFOCUS; DENSE PATTERNS; EDGE PROFILE; EXTREME ULTRAVIOLETS; FABRY-PEROT STRUCTURE; HIGHER EFFICIENCY; IMAGE CONTRASTS; IMAGING PROPERTIES; INSPECTION PROCESS; OPTIMAL THICKNESS; PATTERN SHIFTS; PATTERN SIZE; PHASE SHIFT EFFECT; PROCESS CONDITION; PROCESS LATITUDES; SHADOWING EFFECTS; SIMULATION TOOL; TANTALUM NITRIDES; THICKNESS VARIATION;

LITHOGRAPHY; MOLYBDENUM; NITRIDES; OPTICAL PROPERTIES; OPTIMIZATION; PHASE SHIFT; REFLECTION; TANTALUM; TANTALUM COMPOUNDS;

PHOTOMASKS;

EID: 65449149881     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772533     Document Type: Conference Paper

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