Shadowing effect minimization in EUV mask by modeling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 2, 2004, Pages 849-859

  Besacier, Maxime ^a   Schiavone, Patrick ^a  

^a CEA GRENOBLE   (France)

Author keywords

CD shift; EUV; Geometric effect; Masks; MMFE; Rigorous simulation; Shadowing effect; Slope of edge

Indexed keywords

ELECTROMAGNETISM; GEOMETRICAL OPTICS; IMAGE ANALYSIS; LIGHT ABSORPTION; MIRRORS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

CD SHIFTS; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); GEOMETRIC EFFECTS; MODAL METHOD BY FOURIER EXPANSION (MMFE); RIGOROUS SIMULATION; SHADOWING EFFECTS; SLOPE OF EDGE;

MASKS;

EID: 11844294976     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557771     Document Type: Conference Paper

References (10)

1. K.Otaki, "Asymmetric Properties of the Aerial Image in Extreme Ultraviolet Lithography", Jpn. J. Appl. Phys. Vol. 39, pp 6819-6826, December 2000.
2. A.Erdmann, N.Kachwala, "Enhancements in rigorous simulation of light diffraction from phase shift masks", Proceedings of SPIE Vol 4691, pp 1156-1167, 2002.
3. C.Krautschik, M.Ito, I.Nishiyama, K.Otaki "The impact of the EUV mask phase Response on the Asymmetry of Bossung curves as predicted by rigorous EUV mask simulations", Proceedings of SPIE Vol 4343, pp 392-401, 2001.
4. P.Y.Yan, "The Impact of EUVL Mask Buffer and Absorber Material Properties on Mask Quality and Performance", Proceedings of SPIE Vol 4688, pp 150-160, 2002.
5. F.T.Chen, "Asymmetry and thickness effects in reflective EUV masks'", Proceedings of SPIE Vol 5037, pp 347-357, 2003.
6. P.Schiavone, R.Payerne, "Rigorous simulation of line defects in EUV mask", Microprocesses and Nanotechnology Conference, MNC 2001, Matsue, Japan, 2001.
7. P.Schiavone, G.Granet, J.Y.Robic, "Rigorous electromagnetic simulation of EUV masks: influence of the absorber properties", Microelectronics Eng, 57-58, pp 497-503, 2001.
8. Y.Deng, B.La Fontainc, H.J.Levinson, A.R.Neureuther, "Rigorous EM simulation of the influence of the structure of mask patterns on EUVL imaging", Proceedings of SPIE Vol 5037, pp 302-313, 2003.
9. nd annual International Workshop on Extreme Ultraviolet Lithography, Oct 16-19, 2000.
10. B.S.Bollepalli, M.Khan and F.Cerrina, "Imaging properties of the extreme ultraviolet mask", J. Vac. Sci. Technol. B 16(6), Nov/Dec 1998, pp 3444 - 3448.